Publication:
Large single-crystal growth and characterization of the narrow-gap semiconductor TlBiS2

dc.contributorFen Edebiyat Fakültesi / Faculty of Letters and Sciences Fizik / Physicstr_TR
dc.contributor.authorÖzer, Mehmet
dc.contributor.authorParaskevopoulos, K. M.
dc.contributor.authorAnagnostopoulos, A. N.
dc.contributor.authorKokou, S.
dc.contributor.authorPolychroniadis, E. K.
dc.contributor.authorID2509tr_TR
dc.date.accessioned2018-12-27T14:44:09Z
dc.date.available2018-12-27T14:44:09Z
dc.date.issued1996
dc.description.abstractTIBiS2 is a narrow-gap semiconductor with a layered structure, isoelectronically analogous to PbS. Large single crystals were grown by the Bridgman - Stockbarger method from the melt and characterized by x-ray diffraction. The lattice parameters were determined and the discrepancy between those already reported was removed. From IR reflectivity measurements in the plasma region, the number of carriers was calculated. Also a strong anisotropy of the electrical conductivity was detected and the narrow-gap character of the material was supported by electrical measurements in the range of 10 - 300 K.tr_TR
dc.identifier.issn0268-1242
dc.identifier.urihttps://doi.org/10.1088/0268-1242/11/10/009
dc.identifier.urihttps://hdl.handle.net/11413/4189
dc.language.isoen_UStr_TR
dc.relationSemiconductor Science and Technologytr_TR
dc.titleLarge single-crystal growth and characterization of the narrow-gap semiconductor TlBiS2tr_TR
dc.typeArticletr_TR
dspace.entity.typePublication

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